DALI Thermal
High Detectivity Uncooled Thermal DetectorsAmorphous silicon material is well known for many applications and its use for uncooled infrared detector production benefits from a simple technology easier to master than other technologies making use of different material1, 2. The advantage of amorphous silicon is to be easily integrated onto silicon substrate at temperature compatible with CMOS readout integrated circuit using well mastered deposition and etching technologies. By pushing the design rules closer to the limit, the amorphous silicon technology enables the manufacturing of detector arrays based on 25 μm pixel size and promises dramatic improvement in system size and cost while keeping the thermal time constant as low as 5 ms.

DM2538 
 Uncooled FPA Detector thermal imaging detector Tech Specs 


Amorphous silicon material is well known for many applications and its use for uncooled infrared detector production benefits from a simple technology easier to master than other technologies making use of different material1, 2. The advantage of amorphous silicon is to be easily integrated onto silicon substrate at temperature compatible with CMOS readout integrated circuit using well mastered deposition and etching technologies. By pushing the design rules closer to the limit, the amorphous silicon technology enables the manufacturing of detector arrays based on 25 μm pixel size and promises dramatic improvement in system size and cost while keeping the thermal time constant as low as 5 ms.


Items

DM2538

Detector type

a-Si

Array size

384×288

Pixel pitch

25×25μm

Spectral response

8~14μm

Temperature control

/

Frame rate

≤60Hz

NETD(f/1,300K,50Hz)

60mK

Responsivity

≥8mV/K

Operability

≥99.5%

Consumption(Typ)(without TEC)

130mW

Dimension (pins excluded)

25.4×25.4×4.1mm

Weight

≤7g

Operating temperature

-40℃~+60℃

Storage temperature

-40℃~+85℃

Related Products
Hot Tags: high detectivity uncooled thermal detectors, China, suppliers, manufacturers, wholesale, factory