Add:No.639, Binkang Rd, Hangzhou, Zhejiang, China
Uncooled FPA Detector thermal imaging detector Tech Specs
Amorphous silicon material is well known for many applications and its use for uncooled infrared detector production benefits from a simple technology easier to master than other technologies making use of different material1, 2. The advantage of amorphous silicon is to be easily integrated onto silicon substrate at temperature compatible with CMOS readout integrated circuit using well mastered deposition and etching technologies. By pushing the design rules closer to the limit, the amorphous silicon technology enables the manufacturing of detector arrays based on 25 μm pixel size and promises dramatic improvement in system size and cost while keeping the thermal time constant as low as 5 ms.
Dimension (pins excluded)